Examples of the the word, etch , in a Sentence Context

The word ( etch ), is the 14028 most frequently used in English word vocabulary

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  1. Core 2. Other distributions include support for it such as Debian as of the, etch ,release, Ubuntu as of 8.04 Hardy Heron, Hardened Gentoo, and Yellow Dog Linux.
  2. The material being etch ed (i.e. when the aspect ratio approaches unity). Wet, etch ,processes are generally isotropic in nature, which is often indispensable for
  3. In the silicon. The surface of these grooves can be atomically smooth if the, etch ,is carried out correctly, with dimensions and angles being extremely accurate.
  4. Well as packages designed especially for people with disabilities. Debian 4.0 (, etch ,) was released April 8,2007, for the same number of architectures as in sarge.
  5. Its failure to meet the release criteria, it was dropped before the release of, etch , The OBI Debian won the 2007 poll on Server Distribution of the Year by
  6. Etching a rectangular hole in a (100)-Si wafer results in a pyramid shaped, etch ,pit with 54.7° walls, instead of a hole with curved sidewalls as with isotropic
  7. Determined by the mask remains on the sample. Steps may then be taken to ", etch ," away areas of the sample where no photoresist remains. UV radiation is used
  8. Printed. This will show the printmaker the different degrees or depths of the, etch , and therefore the strength of the ink color, based upon how long the plate is
  9. The path of the ionized plastic. The net result is a conical shaped pit or, etch ,pit in the plastic. To etch pits are measured under a high power microscope (
  10. Technique is wafer damage. For analysis Another application of sputtering is to, etch ,away the target material. One such example occurs in Secondary Ion Mass
  11. Processing involving etch ing,e.g. the wristwatch tuning fork crystals, low, etch , channel density is desirable. To etch channel density for swept quartz is
  12. Includes applying photoresist, exposing to the image, followed by an, etch ,step using iron chloride, cupric chloride or an alkaline ammonia etch ing
  13. Same method is used in some PCB etch ing tanks, where sodium polysulphate (fine, etch ,crystals) are combined with sulfuric acid to oxidize the copper surface and
  14. Gas or gas mixture * Semiconductor processing, notably ion implantation, dry, etch , and PVD, ALD,PECVD and CVD deposition and soon in photolithography * Medical
  15. Be etch ed without a chemical reaction. It is a very complex task to develop dry, etch ,processes that balance chemical and physical etch ing, since there are many
  16. The wristwatch tuning fork crystals, low etch channel density is desirable. The, etch ,channel density for swept quartz is about 10–100 and significantly more for
  17. Under a high power microscope (typically 1600X oil-immersion),and the, etch ,rate is plotted as a function of the depth in the stacked plastic. This yields
  18. Process can easily be used to etch completely through a silicon substrate, and, etch , rates are 3–6 times higher than wet etch ing. Die preparation After preparing a
  19. 10–100 and significantly more for swept quartz. Presence of etch channels and, etch ,pits degrades the resonator's Q and introduces collinearities. Quartz crystals
  20. Automobile exhaust, while cars in deserts may be subjected to sandstorms which, etch ,or strip paint. A model that is weathered would not fit as many layouts as a
  21. Is the etch ing of silicon in KOH (potassium hydroxide),where Is planes, etch ,approximately 100 times slower than other planes (crystallographic
  22. Uses an argon plasma. Etching In semiconductor industry sputtering is used to, etch ,the target. Sputter etch ing is chosen in cases where a high degree of etch ing
  23. Move about the earth as one will; think, speak,write, draw,paint, carve, etch , mold, build,and dress as one will; love when, where and with whom one will;
  24. Typical relief gratings. Semiconductor technology today is also utilized to, etch ,holographically patterned gratings into robust materials such as fused silica.
  25. Equipment, there is a migration to 200 mm lines and select new tools, including, etch , and bonding for certain MEMO applications. Marvin Lee Minsky (born August 9
  26. XeF2 has the advantage of a tuition-free release unlike wet enchants. Its, etch ,selectivity to silicon is very high, allowing it to work with photoresist,SiO2
  27. Of the point release; for example, the latest point release of version 4.0 (, etch ,) as of 8 December 2010 is 4.0r9. From Debian 5.0 (Lenny),the numbering
  28. It should not be coated with thoracic acid or any other substance, as this can, etch ,the surface; it does not have to be" protected" like a diamond. Synthetic and
  29. Plastic. The net result is a conical shaped pit or etch pit in the plastic. The, etch ,pits are measured under a high power microscope (typically 1600X oil-immersion
  30. Watches, for cutting the tuning fork 32768 Hz crystals, are grown with very low, etch ,channel density. Crystals for SAW devices are grown as flat, with large X-size
  31. Aspect ratios of 50 to 1 can be achieved. The process can easily be used to, etch ,completely through a silicon substrate, and etch rates are 3–6 times higher
  32. A common approach is to use a field emitter array, one interesting idea is to, etch ,electrodes to form hinged flaps – similar to the technology used to create the
  33. The downbeat – with heavy emphasis on the first beat of every measure to, etch ,his distinctive sound, rather than the backbeat that typified African American
  34. Quartz is about 10–100 and significantly more for swept quartz. Presence of, etch ,channels and etch pits degrades the resonator's Q and introduces
  35. Is a special subclass of RIE that is growing in popularity. In this process, etch ,depths of hundreds of micrometers are achieved with almost vertical sidewalls.
  36. Difluoride etch ing Xenon difluoride (XeF2) is a dry vapor phase isotropic, etch ,for silicon originally applied for MEMO in 1995 at University of California
  37. Without cracking during handling. A unit wafer fabrication step, such as an, etch ,step or a lithography step, can be performed on more chips per wafer as roughly
  38. Ejected (sputtered) from the surface, and thus ion implantation will slowly, etch ,away a surface. The effect is only appreciable for very large doses. Ion
  39. Other regions can be adversely affected. Another quality indicator is the, etch ,channel density; when the crystal is etch ed, tubular channels are created along
  40. Ready for production. * Stricter design rules – Due to lithography and, etch ,issues with scaling, design rules for layout have become increasingly stringent
  41. Is the primary processing method to achieve such plagiarization although dry, etch ,back is still sometimes employed if the number of interconnect levels is no
  42. Crystals for SAW devices are grown as flat, with large X-size seed with low, etch ,channel density. Special high-Q crystals, for use in highly stable oscillators
  43. Consists of two steps (ASE used in the STS tool). In the 1st Variation,the, etch ,cycle is as follows: (i) SF6 isotropic etch ; (ii) C4F8 passivation; (iii)
  44. Of aerosol sprays, etch ing tools or other sharp or pointed objects used to, etch ,or scratch glass and other hard surfaces, and permanent marking pens, such as
  45. Tool). In the 1st Variation, the etch cycle is as follows: (i) SF6 isotropic, etch ,; (ii) C4F8 passivation; (iii) SF6 anisotropic etch for floor cleaning. In
  46. It should not be coated with thoracic acid or any other substance, as this can, etch ,the surface; they do not have to be" protected" like a diamond. Radiation
  47. Suffered severe damage due to acid rain. Acid-based cleaning chemicals can also, etch ,limestone, which should only be cleaned with a neutral or mild alkaline-based
  48. i) SF6 isotropic etch ; (ii) C4F8 passivation; (iii) SF6 anisotropic, etch ,for floor cleaning. In the 2nd variation, steps (i) and (iii) are combined.
  49. FM Jean, emperor of the Di state Former Qin (b. 317): For other uses of, etch ,or etch ing, see Etching (disambiguation),for the history of the method, see
  50. Material from the wafer either in bulk or selectively and consist primarily of, etch ,processes, either wet etch ing or dry etch ing. Chemical-mechanical plagiarization

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